This collection of user manuals represents some of the guides I've created over the years. Some are dated in the sense that the software/app is several generations out of date by now. My intent here to provide a resource to anyone who may find it useful. Some of these files have been located across the internet in a variety of repositories as they were likely harvested from the original websites on which they were located. These original websites no longer exist in their original form and/or location as the resources I created were passed along to new personnel at the respective institutions.
More guides and manuals will appear here as I locate and archive them.
User Guides (2003)
How to Use Video Clips in Presentations (Powerpoint)
How to Convert a Batch of Images (IrfanView)
How to Capture Images from an Existing Video Clip (ULead Video Studio)
How to Capture Still Images (Irfanview and ULead Video Studio)
How to Capture Video (ULead Video Studio)
Microelectronics Cleanroom | UNC-Charlotte (2004)
Note: These procedures were developed in 2004 for use in the Microelectronics Cleanroom located in the C.C. Cameron Applied Research Center at UNC-Charlotte.
Photoresist Strip for Microposit 1813 Positive Photoresist
This User Guide provides a standard procedure for stripping photoresist from a silicon wafer. Note: Always manipulate wafers with clean tweezers. Teflon-coated tweezers recommended for cleanliness if available.
Photolithography (NFR-014 Negative Photoresist Vertical Wall Process)
Photolithography (NFR-016 Negative Photoresist Liftoff Process)
Photolithography (Microposit Positive Photoresist and Microposit 354 Positive Photoresist Developer
Solitec High Speed Spin Processor
This User Guide provides a Prestart checklist and general procedure for using the Solitec High Speed Spin Processor to spin-coat photoresist thick films on 4" silicon wafers.
This User Guide provides a procedure using Microposit 354 Positive Photoresist Developer
This User Guide provides a Prestart checklist and mask alignment procedure useful for wafers greater than 3 inches diameter.
CVC Sputter Tool (DC Sputter of Aluminum)
This User Guide provides instructions for Preparation and Loading, Pump Down Procedure, Sputtering, Unloading, and a separate guide showing how to load wafers.
This User Guide was updated with newer photos by Cedric Beanlande
Microfabrication Facilities | IATL | University of Iowa, Iowa City, IA (2008)
Photolithography
Clariant AZ 1518 Photoresist and Lift-Off Resist (LOR) 10B/30B
Clariant AZ 1518 Photoresist and Lift-Off Resist (LOR) 10B+PI2555
4" Iron Oxide (FeO) Plate Masks
Sigma SQM-160 Film Thickness Monitor
Cleanroom Research Laboratory | NSERL | UT-Dallas, Richardson, TX (2009)
Temescal 1800 e-Beam Evaporator
(more to come)