The author wishes to thank Dr. *.-*. *****, Department of Electrical and Computer Engineering, for having provided the resources and patience necessary for this investigation. Acknowledgements are also made to the author's former colleague, Nigamanth Lakshminarayana for having provided the cleaning and oxidation of all wafers used for this investigation, and Brad Sharer for having provided a mask design and several repairs made to the equipment prior to the author's work on this project. Additionally, thanks is expressed to those who have provided assistance with analysis of samples, including Dr. Ahmed Faik for his work on both the TEM and SEM, and Saritha Pavuluri for her work with AFM investigations.

The author would also like to extend a note of gratitude to Dr. Harry Leamy, Director, Cameron Applied Research Center, for providing several useful references, John Hudak, Microelectronics Clean Room Facilities Manager, for having provided cleanroom facilities and his expertise in several aspects of the research, and John Brien, Department of Precision Metrology, for having provided voluntary assistance with several electronic diagnostics for our equipment.