The analysis and preparation chamber houses a lateral substrate manipulation carriage and track that permits the substrate to be moved to individual analysis stations and to the substrate holder/heater in the deposition chamber. The chamber currently houses a LEED/AES system for surface diffraction and material analysis. An ion and turbomolecular ion pump are used for independent evacuation. Each pump is independently isolated from the main analysis chamber with respective UHV gate valves.

A low energy diffraction and Auger electron spectroscopy (LEED/AES) system permits surface diffraction to complement RHEED investigations and surface material identification to additionally complement both the LEED and RHEED investigations. The LEED system is operated in the range of 0 - 1 KeV, while the AES is operated in the range of 0 - 3 KeV. LEED was unavailable for the investigation.