1.1 | Metal Oxide Semiconductor Field Effect Transistors
1.2 | Basic MOSFET Goals
1.3 | Three Types of Thin Films
1.4 | Bravais Lattices
1.5 | Homoepitaxy/Heteroepitaxy
1.6 | Several Crystal Defects
1.7 | Basic Diffusion Mechanisms
1.8 | Simplified Construction of Diffusion System
1.9 | Mathematical Reconstruction of \(1 \times 1\) to \(\sqrt{3} \times \sqrt{3}\) Surface
1.10 | Model of the Ideal Si(111)\(1 \times 1\) Surface
1.11 | \( 1\times 1\) and \(2 \times 2\) Surface Schematic
1.12 | \(7\times 7\) Reconstructed Superstructure
1.13 | The Unstable Vacancy Model of the \(\sqrt{3} \times \sqrt{3}\) Surface
1.14 | Si(100)\(2\times1\) Reconstruction
2.1 | Liquid Metal Mediated (LMM) Epitaxy
2.2 | Solid Phase Epitaxy (SPE)
2.3 | The Based SMME Model
2.4 | SMME Diffusion Model
2.5 | Theoretical SI Concentration in Al at \(400^\circ \)C
2.6 | Al Addimer Formation on Si(100)\(2\times 1 \) Surface
2.7 | Drosd-Washburn Atomistic Growth Direction Model
2.8 | Drosd-Washburn Atomistic Growth Model for Si(10)
3.1 | Solid Phase Epitaxy vs SMM-SOI
3.2 | SPE-SOI Facet Formation
3.3 | Separation by Implanted Oxygen (SIMOX) Process
3.4 | Wafer Bonding Methods
3.5 | SMME: Cross-Sectional TEM
3.6 | Basic SMM-SOI Process
3.7 | Simplified Kinetic Model of Mediator Interactions with Oxide and Substrate
3.8 | Proposed Kinetic Model for SMM-SOI Diffusors
3.9 | Lateral SMME Diffusion
3.10 | Si(110) Growth Enhancement
4.1 | Oxide Patterning Process
4.2 | Photolithographic Mask & Seed/Oxide Dimensional Ratio
4.3 | Buffered Oxide and Reactive Ion Etch (RIE)
4.4 | Epitaxial Deposition Process Map
4.5 | Deposition Rate of Al Mediator
4.6 | Deposition Rate of Si Diffusor
4.7 | Substrate Heater/Holder Assembly
4.8 | Pyrometer/Thermocouple Temperature Calibration
5.1 | RHEED Investigation of SMME Si(111)
5.2 | SEM Micrographs of SMME Si(111)
5.3 | RHEED Investigation of SMME SI(100)
5.4 | SEM Micrographs of SMME Si(100)
5.5 | Optical Micrographs of Photoresist
5.6 | SEM Micrographs of Oxide patterns
5.7 | AFM of Vertical Oxide Wall and Seed Area
5.8 | In Situ RHEED Analysis of SMM-SOI Sample
5.9 | Cross Sectional SEM of SMM-SOI Si(111)
5.10 | Shallow Angle of RHEED Beam
5.11 | RHEED Investigation of SMM-SOi Si(111)
5.12 | Cross Sectional TEM of SMM-SOI Si(100)
5.13 | Selected Area Diffraction (SAD) of SMM-SOI Si(100)
5.14 | Optical Mosaic from 10/10 µm Region
5.15 | SEM Mosaic of 10/10 µm Region
5.16 | Schematic of 10/10 µm SOI Investigations
5.17 | SEM of 50/500 µm Region
5.18 | SEM from 2/5 µm Region
5.19 | SEM from 5/10 µm Region
A.1 | Symmetry of the Gaussian Function
A.2 | The Error Function
A.3 | The Complementary Error Function
B.1 | Thermal Oxidation Furnace
B.2 | Photolithographic Equipment
B.3 | Onsite Reactive Ion Etch
B.4 | Stereoscan SEM
B.5 | Molecular Beam Epitaxy System
B.6 | Zeiss 10C Transmission Electron Microscope
C.1 | (001) Diffraction Pattern
C.2 | (011) Diffraction Pattern
C.3 | (111) Diffraction Pattern